Intel Uses ASML's Next-Gen Tool for Panther Lake Chips
ASML announced that Intel has begun using its next-generation High NA EUV lithography machines to produce a portion of its Panther Lake laptop chips, following experiments that started in 2024, as the chipmaker seeks to learn the tool more effectively.
ASML said on Tuesday that Intel has started using its next-generation high numerical aperture (High NA) extreme ultraviolet (EUV) machines to manufacture a portion of its Panther Lake laptop processors, according to Reuters.
The Technology
High NA EUV machines use extreme ultraviolet light to print circuit patterns on microchips with extreme precision, enabling smaller transistors and better energy efficiency. Intel began using the tools for a portion of Panther Lake production after experiments that started in 2024.
Pricing and Availability
Neither Intel nor ASML disclosed the price of the machines or the commercial production timeline for Panther Lake. The technology is expected to be used in future generations of laptop chips.
Competition
Intel competes with TSMC and Samsung in adopting High NA EUV. Analysts say early use could give Intel an edge in learning to operate the machines before rivals, but high costs may delay widespread adoption.
Potential Impact on Intel
This move could help Intel improve chip manufacturing efficiency and reduce long-term costs. However, immediate financial impact is limited as commercial production using High NA is still in early stages.
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